JIANG Hai TAO Kun LI Hengde Tsinghua University
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Beijing
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China lecturer
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Department of Materials Science and Engineering
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Tsinghua University
,
Beijing 100084
,
China
金属学报(英文版)
BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES, IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra at absorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results of AES demonstrate an effect of N~+ implantation near the film surface.The deposited films consist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer, according to the difference of concentration.The micro-Knoop hardness of the film is 25—35 GPa.
关键词:
ion beam assisted deposition
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null
F. Pan
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F. Zeng
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B. Zhao
金属学报(英文版)
Ion beam assisted deposition technique (IBAD) was utilized to systematically studyamorphization in binary metal systems of Nb-magnetic element, i.e., Nb-M (M=Fe,Co or Ni). The glass forming range terned as Nb fraction of Nb-Fe system was about34at.% to 56at.%, that of Nb-Co system was about 32at.% to 72at.% and that of Nb-Ni about 20at.% to 80at.%. Similar percolation patterns were found in amorphousalloy films. The fractal dimensions of the percolation patterns approach to 2, whichindicates 2-D layer growth for amorphous phases. It is regarded that the assistedAr+ ion beam duringthe deposition process plays important role for the 2-D layergrowth. Some metastable crystalline phases were obtained in these three systems byIBAD, e.g., bcc supersaturated solid solutions in Nb-Fe and Nb-Co systems, fcc andhcp phases in Nb-Co and Nb-Ni systems. The formation and competing between theamorphous and the metastable crystalline phases were determined by both the phases'thermodynamic states in binary metal systems and kinetics during IBAD process.
关键词:
amorphization
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null
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null
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null
江海
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陶琨
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李恒德
金属学报
用离子束辅助沉积(IBAD)技术合成氮化硼薄膜,红外吸收谱和透射电镜的观测结果显示,薄膜含有c—BN和h—BN相薄膜Knoop硬度值高达35GPa。逐层剥离的AES谱结果表明,薄膜表面存在氮离子的注入效应,薄膜由注入层、成分均匀层和离子束混合过渡层组成
关键词:
离子束辅助沉积
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BN film
郏义征
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李辉
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胡楠楠
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王清远
稀有金属
氧化铈是一种潜在的可见光催化材料,但是如何实现在氧化铈晶格内的N掺杂是阻碍其发展的主要原因.采用离子束辅助沉积法制备了N掺杂的氧化铈薄膜材料,该方法实现了对氧化铈薄膜的高含量N掺杂,N含量可高达25％,远远高于采用传统方法制备的氮掺杂氧化铈.N1s的高分辨谱显示,掺杂的N替代了氧化铈中的O而实现了N在氧化铈晶格中的掺杂.XRD结果显示,氧化铈薄膜在生长过程中,N离子的轰击并没有改变氧化铈的晶体,但是改变了氧化铈薄膜表面形貌,从SEM上可以看出氧化铈表面颗粒变得细小,薄膜表面变得光滑.紫外可见吸收光谱显示,随着掺N量的增加,氧化铈的光吸收发生红移.
关键词:
氧化铈
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氮掺杂
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离子束辅助沉积
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光吸收
王晨
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杨杰
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范玉殿
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陶琨
材料研究学报
利用电子枪蒸镀Al_2O_3,同时辅以Ar 离子轰击的离子束辅助沉积方法(IBAD)制备Al_2O_3薄膜,并与单纯电子枪蒸镀方法(PVD)制备的薄膜进行了结构和表面形貌的比较。IBAD 法可以得到结构均匀致密的γ-Al_2O_3晶态薄膜,而PVD 方法仅能得到非晶态疏松的结构。分析结果表明,薄膜沉积过程中,提高离子轰击能量和增加基片加热温度在一定程度上具有相同的效果。
关键词:
离子束辅助沉积
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γ-Al_2O_3
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thin film
王松
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岳文
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李星亮
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姚克
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方鹏
材料热处理学报
利用离子束辅助沉积技术和低温离子渗硫技术制备了二硫化钨/钨掺杂类金刚石(WS2/W-DLC)复合薄膜.采用扫描电子显微镜(SEM)、拉曼光谱仪(Raman)、透射电子显微镜(TEM)、纳米硬度仪(Nano-indenter)和多功能摩擦磨损试验机(UMT)考察了薄膜的微观结构与摩擦学性能.结果表明:制备的薄膜在大气环境下表现出优异的力学性能和超低摩擦的性能,该复合薄膜中,硬质强化相纳米碳化物WC1-x和软质润滑相过渡族金属硫化物WS2、FeS均匀镶嵌于类金刚石基体内形成复合结构,复合结构是薄膜表现出优异性能的主要原因.
关键词:
类金刚石(DLC)薄膜
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离子束辅助沉积
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低温离子硫化
吴化
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尤申申
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姜颖
稀有金属
采用空心阴极离子束辅助多弧离子镀技术,通过变换靶材中Ti-Al比例(Al含量分别为30 at％、50 at％和70 at％)沉积了(Ti,Al)N涂层.利用XRD、激光共聚焦显微镜、材料表面微纳米力学测试系统等检测了涂层的质量和性能.研究了涂层的相组成、表面粗糙度、摩擦系数和硬度、以及涂层的耐高温性能等随靶材成分比例改变而变化的规律.结果表明,当靶材中Al含量为50 at％时,沉积层相组成以Ti1-xAlxN为主,涂层粗糙度和摩擦系数最小,分别为0.3188和0.6074,而硬度值最高,为34.19 GPa.加热温度低于800℃时涂层物相组成没有发生明显变化,900℃时涂层产生开裂基体被氧化;空心阴极离子束辅助沉积时能够形成“混合界面”,并减轻涂层表面“大颗粒”现象.
关键词:
离子束辅助沉积
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(Ti,A1)N涂层
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相组成
